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A Deep Dive into the UV222 Material Airlock

A Deep Dive into the UV222 Material Airlock

Industrial Challenge

Transferring equipment between cleanroom zones is a common vulnerability in contamination control. The UV222 Material Airlock is designed to address this challenge by providing a validated, chemical-free decontamination process for materials and equipment before entering higher-grade cleanroom zones.

By utilizing filtered 222 nm Far-UVC light, the system ensures rapid microbial decontamination of both air and exposed surfaces without damaging sensitive materials or generating particles. Far-UVC at 222 nm enables continuous decontamination without these limitations.

Solution Example

Deployment: Sanofi Installation

What Is the UV222 Material Airlock?

The UV222 Material Airlock is an integrated cleanroom transfer system designed to reduce microbial contamination on materials moving between different cleanroom classifications. Developed in close collaboration with pharmaceutical manufacturers including Sanofi, it combines multiple decontamination technologies into a single enclosed transfer chamber.

Unlike traditional pass-through systems that focus on physical separation alone, the UV222 Material Airlock actively decontaminates transferred materials during the transfer process itself. The system is dimensioned to accommodate large equipment including vessels, carts, trolleys, and production tools, as well as smaller components and packaging.

How It Works

The airlock uses excimer-based Far-UVC lamps mounted on the back wall of the chamber, covering equipment surfaces uniformly. As equipment enters the chamber, a preset cycle activates the UV222 light to inactivate microorganisms in seconds. The process is fully automated, ensuring consistent and operator-independent results.

https://uvmedico.com/uv222-material-airlock

Both doors open showing the chamber interior and Far-UVC lamp array during loading.

  1. Material Loading. Equipment is placed inside the airlock from the lower-grade or external cleanroom side. Interior LED lighting allows the operator to confirm correct placement before the cycle begins.
  2. Transfer Initiation. The chamber seals and the automated cycle begins. Interlocked doors prevent simultaneous opening of both sides throughout the cycle.
  3. Far-UVC Decontamination. Filtered 222 nm light sources expose all equipment surfaces, disrupting microbial DNA and RNA within seconds.
  4. HEPA Airflow Control. HEPA-filtered airflow maintains the internal environment and can be run in combination with or independently of the Far-UVC cycle.
  5. Transfer Completion. Once the validated cycle completes, the door status indicator changes colour and the receiving-side door can be opened for transfer into the higher-grade area.

Key Benefits

  • Rapid, residue-free decontamination of equipment surfaces. Microorganisms are inactivated in seconds.
  • No damage to materials. No degradation of plastics, metals, or coatings, a key advantage over conventional 254 nm UVC systems.
  • No particle generation, preserving ISO 14644 cleanroom classifications throughout the transfer process.
  • Integrated barrier function preventing cross-contamination between cleanroom zones.
  • Optimized for large equipment including vessels, carts, trolleys, and production tools up to 1300 x 2100 mm.
  • Chemical-free process with no residues, no manual handling, and no risk of downstream chemical contamination.
  • Bidirectional operation. Either door can serve as entry or exit depending on workflow requirements.
  • Far-UVC lamp array, back wall mounted with optical band-pass filters ensuring only 222 nm wavelengths are emitted.

Aseptic Material Transfer

Material transfer points are among the highest-risk interfaces inside pharmaceutical and biotechnology facilities. Even when personnel gowning procedures are highly optimized, transferred materials ranging from small components to large production vessels can introduce microbial contamination into critical areas. Under EU GMP Annex 1 and modern Contamination Control Strategies (CCS), facilities are expected to implement holistic, documented contamination control measures across all critical transfer processes.

Traditional methods relying on manual wipe-downs or conventional 254 nm UVC systems introduce variability, safety concerns, and material compatibility issues. The UV222 Material Airlock addresses this with an automated, validated cycle that is safer for operators and gentler on materials. The system is particularly suited for pharmaceutical production where cleanroom zoning and aseptic workflows are critical, including sterile fill-finish and biologics manufacturing. High-grade manufacturing facilities adhering to GMP guidelines and formal Contamination Control Strategies benefit from continuous decontamination during material entry.

The UV222 Material Airlock is equally effective for any environment requiring transfer of large equipment such as vessels, carts, and production tools between classified zones, as well as semiconductor and microelectronics manufacturing where contamination control and material compatibility are equally critical.

Safety and Efficacy

Filtered Far-UVC light at 222 nm is generated by krypton chloride excimer lamps fitted with optical band-pass filters. This wavelength has demonstrated strong antimicrobial efficacy while allowing continuous operation alongside personnel and sensitive equipment. Conventional 254 nm UVGI systems penetrate skin and eyes, requiring room clearance, and accelerate degradation of plastics and coatings common in cleanroom environments. Far-UVC at 222 nm avoids both issues.

Far-UVC technology at 222 nm has demonstrated efficacy against the full spectrum of microbial threats found in pharmaceutical cleanrooms: bacteria, viruses, fungi, and bacterial spores. Efficacy testing shows a 99.9% reduction in bacteria and viruses within seconds of exposure. This rapid inactivation rate means the UV222 Material Airlock can deliver validated decontamination without adding meaningful time to material transfer workflows. The system does not damage sensitive materials and generates no particles during operation.

By applying continuous Far-UVC decontamination at the point of material entry, the airlock directly addresses one of the highest-risk contamination pathways in aseptic manufacturing.

Industrial Advantages

Conventional 254 nm UVGI systems require room clearance during operation due to skin and eye penetration risks. This forces facilities into a reactive decontamination model: equipment is cleared from the cleanroom, processed offline, and returned. Downtime, manual handling, and variable recontamination during transfer all compound the contamination risk the system is meant to prevent.

Far-UVC at 222 nm fundamentally changes this. Because it provides continuous operation alongside personnel and equipment, the UV222 Material Airlock enables decontamination at the point of material entry without workflow interruption. Every transfer becomes a validated decontamination event. No offline processing. No downtime. No manual steps introducing new contamination. The result is faster and continues decontamination.

Technical Components

The UV222 Material Airlock integrates the following systems within a single validated unit:

  • Far-UVC lamp array, back wall mounted with optical band-pass filters ensuring only 222 nm wavelengths are emitted.
  • HEPA filtration unit providing cleanroom-grade filtered airflow into the chamber.
  • Touchscreen interface for cycle configuration, real-time monitoring, and access to stored data.
  • Door status light indicators on both doors displaying cycle-active, safe-to-open, and fault states at a glance.
  • Door actuators with manual handle override for emergency or power failure situations.
  • Pressure sensor continuously monitoring chamber air pressure to ensure airflow is directed toward the less clean zone, preventing reverse contamination.
  • Emergency stop button positioned on the exterior of the housing, immediately halting all operation.
  • Interior LED illumination for operator inspection before and after treatment.
  • Backup power supply maintaining door interlocks, emergency stop, and status indicators during mains power failure.
  • BMS and cleanroom validation system integration for remote supervision, automated documentation, and facility-wide compliance.

Measurements and Materials
  • Interior width: 1300 mm
  • Interior height: 2100 mm
  • Interior depth: 1000 mm
  • Overall height: 2500 mm (including HEPA unit)
  • Housing material: 316L stainless steel, compatible with harsh cleaning agents and disinfectants
  • UV wavelength: 222 nm filtered Far-UVC (krypton chloride excimer lamps with optical band-pass filter)
  • Lamp configuration: Back wall mounted array, 4 columns x 7 rows of individual lamp modules
  • Airflow: HEPA-filtered ventilation, operable independently of or in combination with Far-UVC cycle
  • Power: Mains supply with backup battery/UPS for continued operation during power failure
  • Electronic records and full audit trails
  • Traceability across all transfer events
  • Validation documentation (IQ/OQ/PQ)
  • Operational monitoring and cycle reporting
  • Integration with building management and cleanroom validation systems

https://uvmedico.com/uv222-material-airlock

Close-up of the control panel and individual Far-UVC lamp modules inside the chamber.

Regulatory Compliance

The system supports 21 CFR Part 11 documentation requirements and EU GMP Annex 1 expectations, covering:

  • Electronic records and full audit trails
  • Traceability across all transfer events
  • Validation documentation (IQ/OQ/PQ)
  • Operational monitoring and cycle reporting
  • Integration with building management and cleanroom validation systems

To learn more about technology behind the system, you can read more about the material Airlock here.

If you would like to explore how the Material Airlock can be implemented at your facility, or if you have other product or cleanroom requirement, please do not hesitate to contact us. We look forward to finding the right solution together with you.

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